首页> 外国专利> PROCESS FOR MANUFACTURING ELECTROSTATIC ACTUATOR, PROCESS FOR MANUFACTURING LIQUID DROP EJECTION HEAD, ELECTROSTATIC ACTUATOR, LIQUID DROP EJECTION HEAD AND LIQUID DROP EJECTOR

PROCESS FOR MANUFACTURING ELECTROSTATIC ACTUATOR, PROCESS FOR MANUFACTURING LIQUID DROP EJECTION HEAD, ELECTROSTATIC ACTUATOR, LIQUID DROP EJECTION HEAD AND LIQUID DROP EJECTOR

机译:静电执行器的制造过程,液滴喷射头的制造过程,静电执行器,液滴喷射头和液滴喷射器的制造过程

摘要

PROBLEM TO BE SOLVED: To form ITO wiring on a glass substrate thicker than an insulating film on the surface of an opposing silicon substrate, and to perform equipotential joint of the ITO wiring and the silicon substrate precisely.;SOLUTION: The process for manufacturing an electrostatic actuator comprises the step of forming an SiO2 layer 41 on the inside of a silicon substrate 1, forming an insulating film 11 on the surface of the silicon substrate where the SiO2 layer 41 is formed, and forming a silicon substrate equipotential contact recess 24A by etching a surface portion of the silicon substrate 1 corresponding to a glass substrate equipotential contact protrusion 24 on the insulating film side until the SiO2 layer 41 appears, the step of exposing the silicon substrate 1 by etching a portion of the bottom of the equipotential contact recess 24A, and the step of sticking the silicon substrate 1 and a glass substrate 2, sticking the equipotential contact recess 24A and the equipotential contact protrusion 24, and anode joining the silicon substrate 1 exposed portion of the equipotential contact recess 24A and the equipotential contact protrusion 24 under an electrically conductive clearance state.;COPYRIGHT: (C)2008,JPO&INPIT
机译:解决的问题:在比相对的硅衬底的表面上的绝缘膜厚的玻璃衬底上形成ITO布线,并精确地进行ITO布线和硅衬底的等电位连接。静电致动器包括在硅衬底1的内部上形成SiO 2 层41的步骤,在硅衬底的SiO 2 的表面上形成绝缘膜11。形成层41,并通过蚀刻与绝缘膜侧上的玻璃基板等电位接触突起24相对应的硅基板1的表面部分直到SiO 2 ,形成硅基板等电位接触凹部24A。出现层41,通过蚀刻等电位接触凹部24A的底部的一部分来暴露硅基板1的步骤,以及粘附硅基板1和玻璃基板2的步骤,粘附等电位c的步骤。完好无损的凹槽24A和等电位接触突起24,以及阳极在导电间隙状态下将硅基板1的等电位接触凹槽24A和等电位接触突起24的阳极连接起来。版权所有:(C)2008,JPO&INPIT

著录项

  • 公开/公告号JP2008149518A

    专利类型

  • 公开/公告日2008-07-03

    原文格式PDF

  • 申请/专利权人 SEIKO EPSON CORP;

    申请/专利号JP20060338147

  • 发明设计人 YAGI HIROSHI;SANO AKIRA;

    申请日2006-12-15

  • 分类号B41J2/16;B41J2/045;B41J2/055;

  • 国家 JP

  • 入库时间 2022-08-21 20:24:48

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