首页> 外国专利> Device for tracing of master illustration in scale different from scale of master illustration, has two even surfaced, square frames which are suitably arranged into each other and are spanned by orthogonal grid

Device for tracing of master illustration in scale different from scale of master illustration, has two even surfaced, square frames which are suitably arranged into each other and are spanned by orthogonal grid

机译：用于以不同于母版图比例尺的比例绘制母版图的装置，具有两个平坦的，方形的框架，这些框架彼此适当地排列并被正交网格覆盖

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摘要

The device consists of two even surfaced, square frames (12) which are suitably arranged into each other. The frames are spanned in each case by an orthogonal grid (20). The grid gap (28) of the frame can conform to the respective grid size.

机译：该设备由两个均匀排列的平整的方形框架（12）组成。在每种情况下，框架都由正交网格（20）跨越。框架的栅格间隙（28）可以符合各自的栅格尺寸。

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公开/公告号DE202007000220U1

专利类型
公开/公告日2007-04-12

原文格式PDF
申请/专利权人 RAHMSTORF DIETMAR;
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申请/专利号DE202007000220U1
发明设计人
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申请日2007-01-08
分类号B44D3/00;
国家 DE
入库时间 2022-08-21 20:28:59

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