首页> 外国专利> Polarization influencing optical arrangement for e.g. projection lens system, has optical unit changing distribution in central area of beam cross section, where beam has approximate tangential polarization distribution in central area

Polarization influencing optical arrangement for e.g. projection lens system, has optical unit changing distribution in central area of beam cross section, where beam has approximate tangential polarization distribution in central area

机译：影响例如光学器件的偏振的投影透镜系统，其光学单元在光束横截面的中心区域具有变化的分布，其中光束在中心区域具有近似的切向偏振分布

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摘要

The arrangement (300) has a polarization influencing optical unit (100) converting a given input polarization distribution of a light beam, which passes through the arrangement, with an exclusion of a partition of a light beam cross section into an approximate tangential polarization distribution. Another polarization influencing optical unit (200) changes the distribution in a central area of the beam cross section. The beam has the approximate tangential polarization distribution in the central area of the cross section. An independent claim is also included for a method for microlithographic manufacturing of microstructure components.

机译：布置（300）具有偏振影响光学单元（100），该偏振影响光学单元（100）将穿过布置的光束的给定输入偏振分布转换成将光束横截面的一部分排除为近似切向偏振分布。另一个影响偏振的光学单元（200）改变光束横截面的中心区域中的分布。光束在横截面的中心区域具有近似的切向偏振分布。还包括一种用于微光刻制造微结构部件的方法的独立权利要求。

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公开/公告号DE102006015213A1

专利类型
公开/公告日2007-10-11

原文格式PDF
申请/专利权人 CARL ZEISS SMT AG;
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申请/专利号DE20061015213
发明设计人 FIOLKA DAMIAN;WEISS MARKUS;WALTER MARKUS;SCHLESENER FRANK;HARTJES JOACHIM;SLUCHA BENYAMIN;FEDERAU HAGEN;
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申请日2006-03-30
分类号G03F7/20;G02B27/28;G02B5/30;
国家 DE
入库时间 2022-08-21 20:29:20

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