首页> 外国专利> Opto-electronic measuring method for absolute measurement of gaps/clearances applies two or more stages with different large areas of clearness and different measuring accuracy

Opto-electronic measuring method for absolute measurement of gaps/clearances applies two or more stages with different large areas of clearness and different measuring accuracy

机译:绝对测量间隙/间隙的光电测量方法适用于两个或多个阶段,具有不同的大净空区域和不同的测量精度

摘要

Used for measurement from two sources of light with different average wavelengths (~L), light is guided with a probe to a measuring object surface. Reflected light is picked up again and fed to an interferometer with a plane mirror arranged at a slant so as to generate interference bands, which are detected with a line camera. An independent claim is also included for an optoelectronic measuring device for absolute measurement of gaps/clearances in two or more stages with different large areas of clearness and different measuring accuracy.
机译:用于从具有不同平均波长(〜L)的两个光源进行测量时,将光通过探头引导至被测对象表面。再次拾取反射的光,并将其馈送到具有倾斜布置的平面镜的干涉仪,以产生干涉带,该干涉带由线相机检测。光电测量装置还包括独立权利要求,该光电测量装置用于以不同的大的净空区域和不同的测量精度在两个或更多个阶段中绝对测量间隙/间隙。

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