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WAVEGUIDE STRUCTURES INTEGRATED WITH STANDARD CMOS CIRCUITRY AND METHODS FOR MAKING THE SAME

机译:与标准CMOS电路集成的波导管结构及其制造方法

摘要

A waveguide structure and method of making a waveguide for communicating optical signals is provided. The waveguide structure is made using standard CMOS fabrication operations and is integrated on the same chip having digital CMOS circuitry. An example method of making the waveguide includes forming a contact through a dielectric layer down to a substrate and coating sidewalls of the contact with a first metallization coating. The contact is then filled with a dielectric material. A partial waveguide structure is formed over the first metallization coating and the dielectric material of the contact. The partial waveguide structure is defined by a waveguide dielectric structure and a second metallization coating that is defined over the waveguide dielectric structure. A third metallization coating is then formed to define spacers along sides of the partial waveguide structure, the first metallization coating, the second metallization coating. The third metallization coating is configured to complete the waveguide structure that is filled with the waveguide dielectric structure. Optical signals can then be propagated through the waveguide structure and can be interfaced with other CMOS digital circuitry.
机译:提供了一种波导结构和制造用于传输光信号的波导的方法。波导结构使用标准CMOS制造操作制成,并集成在具有数字CMOS电路的同一芯片上。制作波导的示例方法包括形成穿过介电层直至基底的接触,并用第一金属化涂层涂覆接触的侧壁。然后用电介质材料填充触点。在第一金属化涂层和触点的介电材料上形成部分波导结构。部分波导结构由波导介电结构和在波导介电结构上限定的第二金属化涂层限定。然后形成第三金属化涂层以沿着部分波导结构,第一金属化涂层,第二金属化涂层的侧面限定间隔物。第三金属化涂层被配置为完成用波导电介质结构填充的波导结构。然后,光信号可以通过波导结构传播,并可以与其他CMOS数字电路接口。

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