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METHOD OF PRODUCING CVD DIAMOND TOOL FOR FOR LOW SURFACE-ROUGHNESS MACHINING BY USING POLISHED NANO-CVD DIAMOND MATERIALS
METHOD OF PRODUCING CVD DIAMOND TOOL FOR FOR LOW SURFACE-ROUGHNESS MACHINING BY USING POLISHED NANO-CVD DIAMOND MATERIALS
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机译:用抛光的纳米CVD金刚石材料生产用于低表面粗糙度加工的CVD金刚石工具的方法
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摘要
A method for producing a CVD(Chemical Vapor Deposition) diamond tool for low surface-roughness machining is provided to lengthen the lifespan of the tool and allow for ease of machining by using diamond materials having isotropic properties. A method for producing a CVD diamond tool for low surface-roughness machining is characterized in that the particle size of diamond is 1 micrometer or less in view of the total thickness, and the diamond has a thickness of 30 micrometers or greater and 2 mm or less and a surface roughness of Ra=0.1 micrometer or less. The machined object has a roughness of Ra=0.2 micrometer or less or Rmax=1.0 micrometer or less.
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