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APPARATUS FOR CLUSTER FILM FORMATION, METHOD FOR CLUSTER FILM FORMATION, APPARATUS FOR CLUSTER FORMATION, AND METHOD FOR CLUSTER FORMATION
APPARATUS FOR CLUSTER FILM FORMATION, METHOD FOR CLUSTER FILM FORMATION, APPARATUS FOR CLUSTER FORMATION, AND METHOD FOR CLUSTER FORMATION
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机译：用于群集膜形成的设备，用于群集膜形成的方法，用于群集形成的设备和用于群集形成的方法
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摘要
This invention provides an apparatus for cluster film formation. In this apparatus, a laser beam (2) is applied to a target (1) within a cluster formation vessel (5) to produce vapor of the material which generate impact waves (4) of an inert gas. The impact waves (4) are reflected from the wall of the cluster formation vessel (5) and confine the material vapor, being advanced, in a specific region. The collision of atoms or molecules in the material vapor with each other produces a group of clusters which is then allowed to flow out through a flow-out window (7) and is applied onto a substrate (9) to form a cluster film (10). The sectional area of the laser beam (2) on the target surface is increased in response to an increase in energy intensity of the laser beam (2) to simultaneously realize the increased amount of the material vapor generated and efficient generation of the impact waves of the inert gas. At the same time, the size of the cluster formation vessel is increased so as to satisfy the requirement that the reflected waves of the impact waves confine the material vapor.
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