首页> 外国专利> Tunnel formation process involves placing tunneling device into well formed in transition zone between two tunnel sections, and modifying diameter of second tunnel section by performing excavation using tunneling device

Tunnel formation process involves placing tunneling device into well formed in transition zone between two tunnel sections, and modifying diameter of second tunnel section by performing excavation using tunneling device

机译:隧道形成过程包括将隧道装置放置在两个隧道段之间的过渡带中形成的井中,并通过使用隧道装置进行挖掘来修改第二隧道段的直径

摘要

The method involves forming a first vertical well in the transition zone between the first section and second section of a tunnel, and placing a tunneling device into the first vertical well. The tunneling device is used to modify diameter of the second tunnel section by excavating the second tunnel section until suitable and greater diameter is reached.
机译:该方法包括在隧道的第一部分和第二部分之间的过渡区域中形成第一垂直井,并将隧道装置放置在第一垂直井中。该隧道装置用于通过挖掘第二隧道部分直到达到合适的更大直径来改变第二隧道部分的直径。

著录项

  • 公开/公告号ES2270742A1

    专利类型

  • 公开/公告日2007-04-01

    原文格式PDF

  • 申请/专利权人 ENIA TECNICA Y GESTION S.L.;

    申请/专利号ES20060003094

  • 发明设计人 BOTE I FRECH RAFAEL;

    申请日2006-12-04

  • 分类号E21D9/06;

  • 国家 ES

  • 入库时间 2022-08-21 20:54:33

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