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With the gas barrier properties film and anodizing the aforementioned aluminum film the aluminum film where
With the gas barrier properties film and anodizing the aforementioned aluminum film the aluminum film where
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机译：通过阻气性膜并阳极氧化上述铝膜，铝膜在其中
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摘要
PROBLEM TO BE SOLVED: To provide a gas barrier film having extremely high barrier properties, a method for simply producing the gas barrier film, and a laminated material using this gas barrier film. ;SOLUTION: A gas barrier film is constituted by providing a metal film 3 and a metal oxide film 4 formed by anodically oxidizing the metal film 3 on at least one surface of a base material film 2. In this case, the oxygen gas permeability of the gas barrier film is set to 0.3 [cc/m2/day] or less and the steam permeability thereof is set to 0.3 [g/m2/day] or less. This gas barrier film is produced by forming the metal film 3 on at least one surface of the base material film 2 by either one of a vacuum vapor deposition method, an ion plating method, a sputtering method and a chemical vapor deposition method and forming the metal oxide film 4 due to anodic oxidation on the metal film by a method wherein the metal film 3 is dipped in an anodic oxidation soln. in a state connected to the anode of an external power supply to be opposed to a cathode and a current is applied across the anode and the cathode.;COPYRIGHT: (C)2000,JPO
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机译：解决的问题：为了提供具有极高的阻隔性的阻气膜，简单地制造该阻气膜的方法以及使用该阻气膜的层压材料。 ;解决方案：阻气膜是通过在基底膜2的至少一个表面上提供金属膜3和通过对金属膜3进行阳极氧化而形成的金属氧化物膜4构成的。阻气膜为0.3 [cc / m 2 /天]以下，且水蒸气透过率为0.3 [g / m 2 /天]以下。通过用真空气相沉积法，离子镀法，溅射法和化学气相沉积法中的任一种在基材膜2的至少一个表面上形成金属膜3并形成金属膜3来制备该阻气膜。通过将金属膜3浸入阳极氧化溶液中的方法在金属膜上进行阳极氧化而形成金属氧化物膜4。在与外部电源的阳极连接并与阴极相对的状态下，在阳极和阴极之间施加电流。;版权所有：（C）2000，JPO
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