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ELECTRON BEAM EXPOSURE SYSTEM, ELECTRONIC BEAM DEFOCUS CORRECTION METHOD, AND MEASURING METHOD OF ELECTRON BEAM DEFOCUS
ELECTRON BEAM EXPOSURE SYSTEM, ELECTRONIC BEAM DEFOCUS CORRECTION METHOD, AND MEASURING METHOD OF ELECTRON BEAM DEFOCUS
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机译：电子束曝光系统，电子束去偏校正方法及电子束去偏测量方法
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摘要
PROBLEM TO BE SOLVED: To provide an electron beam exposure system, or its method, reducing defocusing on a sub-deflection region plane as well as a main deflection region plane.;SOLUTION: The electron beam exposure system comprises: a main deflector 214 and a sub deflector 212; and an alignment coil 210 for translating the position of electron beam 200 in the main deflector 214 and the sub deflector 212. When deflecting beam by the sub deflector 212, the electron beam 200 is shifted by the alignment coil 210 so that defocusing on a sample plane becomes minimum. When deflecting beam by the main deflector 214, focusing of the electron beam 200 is corrected so that defocusing on the sample plane becomes minimum.;COPYRIGHT: (C)2007,JPO&INPIT
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