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COMPOSITION EVALUATING METHOD AND PHYSICAL PROPERTY EVALUATING METHOD OF NITRIDING SILICON OXIDE FILM

机译:氮化硅膜的成分评估方法及物性评估方法

摘要

PROBLEM TO BE SOLVED: To easily evaluate composition and composition distribution in the minute region of nitriding silicon oxide film without destroying it.;SOLUTION: In the evaluating method of composition of the nitriding silicon oxide film 2 formed on a substrate 1, the composition or the composition distribution of the nitriding silicon oxide film 2 is evaluated by measuring and analyzing a photoluminescence spectrum employing laser as a light source therefor.;COPYRIGHT: (C)2007,JPO&INPIT
机译:解决的问题:为了容易地评估渗氮氧化硅膜的微小区域中的成分和成分分布而不破坏它;解决方案:在评估形成在基板1上的渗氮氧化硅膜2的成分的方法中,成分或通过使用激光作为光源测量和分析光致发光光谱来评估氮化氧化硅膜2的组成分布。;版权所有:(C)2007,JPO&INPIT

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