首页> 外国专利> 2-LENS OPTICAL SYSTEM SCANNING TYPE ABERRATION CORRECTED FOCUSED ION BEAM DEVICE, 3-LENS OPTICAL SYSTEM SCANNING TYPE ABERRATION CORRECTED FOCUSED ION BEAM DEVICE, AND 2-LENS OPTICAL SYSTEM PROJECTION TYPE ABERRATION CORRECTED ION LITHOGRAPHY DEVICE AS WELL AS 3-LENS OPTICAL SYSTEM PROJECTION TYPE ABERRATION CORRECTED ION LITHOGRAPHY DEVICE

2-LENS OPTICAL SYSTEM SCANNING TYPE ABERRATION CORRECTED FOCUSED ION BEAM DEVICE, 3-LENS OPTICAL SYSTEM SCANNING TYPE ABERRATION CORRECTED FOCUSED ION BEAM DEVICE, AND 2-LENS OPTICAL SYSTEM PROJECTION TYPE ABERRATION CORRECTED ION LITHOGRAPHY DEVICE AS WELL AS 3-LENS OPTICAL SYSTEM PROJECTION TYPE ABERRATION CORRECTED ION LITHOGRAPHY DEVICE

机译:2透镜光学系统扫描型像差校正后的离子束装置,3透镜光学系统扫描型像差校正后的离子束装置和2透镜光学系统投影型像差校正后的离子束照相系统,3透镜装置类型像差校正的离子光刻设备

摘要

PROBLEM TO BE SOLVED: To provide 2-lens and 3-lens optical system scanning type aberration corrected focused ion beam device and 2-lens and 3-lens optical projection type aberration corrected ion lithography device.;SOLUTION: An extraction electrode to extract an ion beam from an ion source, a gun lens constituted of a condenser lens to control an opening angle of the extracted ion beam, an current limitation diaphragm to extract the ion beam having a specific radiation angle from the ion beams having comparatively wide radiation angles generated from the ion source, an electrostatic type aberration corrected device to correct an electrostatic type opening angle control lens capable of the open lens control without changing current amount of the ion beam which has passed the current limitation diaphragm, an electrostatic type aberration corrected device to correct color aberration and spherical aberration, and an electrostatic type objective lens to focus the beams on a sample are arranged in this order, and furthermore, this is provided with a deflector to scan the focused ion beams in the two-dimensional direction on a sample.;COPYRIGHT: (C)2008,JPO&INPIT
机译:解决的问题:提供2透镜和3透镜光学系统扫描型像差校正聚焦离子束装置和2透镜和3透镜光学投影型像差校正离子光刻装置。来自离子源的离子束,由聚光镜构成的用于控制所提取离子束的张角的枪透镜,用于从具有较大辐射角的离子束中提取具有特定辐射角的离子束的限流膜片静电型像差校正装置从离子源起,通过静电型像差校正装置来校正能够在不改变通过限流膜片的离子束的电流量的情况下进行开镜控制的静电型像差校正装置。色差和球差,以及将光束聚焦在样品上的静电型物镜按此顺序操作,此外,它还配有偏转器,用于在样品上的二维方向上扫描聚焦的离子束。;版权所有:(C)2008,JPO&INPIT

著录项

  • 公开/公告号JP2007287495A

    专利类型

  • 公开/公告日2007-11-01

    原文格式PDF

  • 申请/专利权人 JEOL LTD;

    申请/专利号JP20060114024

  • 发明设计人 SAKAGUCHI KIYOSHI;ZACH JOACHIM;

    申请日2006-04-18

  • 分类号H01J37/153;H01J37/305;H01J37/317;H01L21/027;

  • 国家 JP

  • 入库时间 2022-08-21 21:14:55

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