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Method for measuring optical properties of medium having thin-film stack illumated by focused field and method for setting thickness of optical recording medium
Method for measuring optical properties of medium having thin-film stack illumated by focused field and method for setting thickness of optical recording medium
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机译：测量具有聚焦场照亮的薄膜叠层的介质的光学性能的方法和设置光学记录介质的厚度的方法
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摘要
PURPOSE: A method for measuring optical characteristics of a thin film adaptive medium is provided to exactly measure the optical characteristics even when numerical apertures are set up over 1.0, so as to design the thin film adaptive medium according to the set numerical apertures. CONSTITUTION: A polar angle and an azimuth of a wave vector, and an electric field relating to thickness of j layer are calculated, on the basis of a 'Debye' integral. A magnetic field is calculated. The magnetic field is expressed, by integrating a vector multiplication of the wave vector and the electric field relating to a solid angle. A vector multiplication value is performed for the electric field and the magnetic field, to calculate a pointing vector. The pointing vector is expressed by taking a multiplicand part of the vector multiplication value. A reflection rate, a transmission rate, and an absorption rate of the j layer are presented with the pointing vector.
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