首页> 外国专利> APPLICABILITY IMPROVER FOR PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE RESIN COMPOSITION CONTAINING THE SAME

APPLICABILITY IMPROVER FOR PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE RESIN COMPOSITION CONTAINING THE SAME

机译：感光性树脂组合物和包含相同感光性树脂的组合物的适用性研究

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摘要

To solve simultaneously the problems of scale-shaped unevenness (scale unevenness) and a raise (bead) in the edge of a substrate coming into existence upon application of a photosensitive resin composition onto particularly a large-size substrate, a silicone oil represented by the general formula (1) below is incorporated into a photosensitive resin composition containing an alkali-soluble resin such as novolak resin and a photosensitizer having a quinonediazide group in an amount of 50 to 5,000 ppm based on the total solids content of a photosensitive resin composition. wherein R₁, R₂, R₃, R₄, R₅ and R₆ independently represent a hydrogen atom, a hydroxyl group, a C_1-4 alkyl group or an aryl group, m is an integer of 1 to 40, and n is an integer of 1 to 40.

机译：为了同时解决在将感光性树脂组合物涂布到特别大尺寸的基板上时在基板的边缘上出现鳞片状的不均匀（鳞片状的不均匀）和隆起（珠粒）的问题，以将以下通式（1）掺入光敏树脂组合物中，所述光敏树脂组合物包含基于光敏树脂组合物的总固体含量为50-5,000ppm的碱溶性树脂如线型酚醛清漆树脂和具有醌二叠氮基的光敏剂。 <图像文件=“ IMGA0001.GIF” he =“ 40” id =“ ia01” imgContent =“ chem” imgFormat =“ GIF” wi =“ 136” /> 其中R _{1 ，R _{2 ，R _{3 ，R _{4 ，R _{5 和R _{6 独立地表示氢原子，羟基，C _{1-4 烷基或芳基，m为1至40的整数，n为1至40的整数。}}}}}}}

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公开/公告号EP1598700A1

专利类型
公开/公告日2005-11-23

原文格式PDF
申请/专利权人 AZ ELECTRONIC MATERIALS (JAPAN) K.K.;
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申请/专利号EP20030772776
发明设计人 WATANABE JUNICHIROC/O CLARIANT(JAPAN)K.K.;TAKEDA TAKASHIC/O CLARIANT(JAPAN)K.K.;
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申请日2003-11-14
分类号G03F7/004;G03F7/039;
国家 EP
入库时间 2022-08-21 21:32:45

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