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Multiple layers of SiO2 and quantum dots for optical device of PbTe keyer

机译:PbTe键控器光学器件的多层SiO2和量子点

摘要

"Layers of SiO ~ 2 ~ and quantum dots of PbTe keyer for optical device.The present invention relates to the manufacture of multilayer SiO ~ 2 ~ and quantum dots of PbTe, used as active region.For the manufacture of any kind of nonlinear optical device key in shaping a Fabry - Perot optical cavity - stabilization components.This device has the advantage of being completely optical, only the light is interacting, and does not need any mechanical process, electric.Acoustic or mouse to control light.There is also the use of techniques of photolithography, extremely expensive, with devices based on silicon, for example, or any other make use of this technique.For the manufacture of multilayer QD of PbTe and SiO ~ 2 ~ of alternating manner, the present invention makes use of the two processes alternate deposition, laser ablation,Laser ablation for the manufacture of layers of QD of PbTe and chemical vapor deposition plasma enhanced PECVD for the layers of SiO ~ 2 ~.This invention has its main application as a key optical ultra fast in the range of 1 ps that operates in the region of the optical communications where losses due to attenuation of the optical fibers of silica areMinors.
机译:用于光学器件的SiO〜2〜层和PbTe键控量子点。本发明涉及用作有源区的多层SiO〜2〜和PbTe量子点的制备。用于制造任何种类的非线性光学设备是塑造Fabry-Perot光学腔-稳定组件的关键。此设备的优点是完全光学,仅光在相互作用,不需要任何机械过程,电气,声学或鼠标来控制光。还使用了非常昂贵的光刻技术,例如基于硅的器件,或任何其他利用这种技术的方法。为了交替制造PbTe和SiO〜2〜的多层QD,本发明两种方法的交替使用:激光烧蚀,激光烧蚀用于制造PbTe量子点的层和化学气相沉积等离子增强的PECVD用于SiO〜2〜的层。作为在1 ps范围内的关键光学超快应用而应用,它在光通信区域中工作,在该区域中,由于二氧化硅光纤衰减引起的损耗很小。

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