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Method for selectively stressing MOSFETs to improve charge carrier mobility
Method for selectively stressing MOSFETs to improve charge carrier mobility
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机译:选择性地向MOSFET施加应力以改善载流子迁移率的方法
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摘要
A strained channel MOSFET device with improved charge mobility and method for forming the same, the method including providing a first gate with a first semiconductor conductive type and second gate with a semiconductor conductive type on a substrate; forming a first strained layer with a first type of stress on said first gate; and, forming a second strained layer with a second type of stress on said second gate.
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