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Exposure apparatus and method of measuring Mueller Matrix of optical system of exposure apparatus
Exposure apparatus and method of measuring Mueller Matrix of optical system of exposure apparatus
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机译：曝光设备和测量曝光设备光学系统的穆勒矩阵的方法
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摘要
A method is provided for measuring Mueller Matrix of an optical system of an exposure apparatus. Light flux from a light source is serially converted into any of a plurality of polarized light beams perpendicular to each other on Poincare sphere and is output. This polarized light beam is injected into a projection optical system or the like to be converted into a converted polarized light beam based on Mueller matrix of each optical system. With a linear polarizer or a linear phase retarder being properly inserted into an optical path of the converted polarized light beam, a light intensity is measured. Stokes parameters of the converted polarized light beam are calculated based on the measured light intensity.
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