首页> 外国专利> Phase measurement apparatus for measuring characterization of optical thin films

Phase measurement apparatus for measuring characterization of optical thin films

机译:用于测量光学薄膜特性的相位测量设备

摘要

A phase measuring apparatus for measuring phase characteristics of a film applied onto an object to be measured includes a shearing interference system for providing incident light onto the object or light reflected on the object with shearing interference, a detector for detecting shearing interference information, and a computing unit for calculating the phase characteristics of the film based on the shearing interference information.
机译:一种用于测量施加到待测物体上的薄膜的相位特性的相位测量设备,包括:用于提供入射光到物体上或在物体上反射的光具有剪切干涉的剪切干涉系统;用于检测剪切干涉信息的检测器;以及计算单元,用于基于剪切干涉信息计算膜的相位特性。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号