首页> 外国专利> Stage apparatus, exposure apparatus, charged beam drawing apparatus, device manufacturing method, substrate potential measuring method, and electrostatic chuck

Stage apparatus, exposure apparatus, charged beam drawing apparatus, device manufacturing method, substrate potential measuring method, and electrostatic chuck

机译:载物台装置,曝光装置,带电束描绘装置,器件制造方法,基板电位测量方法和静电吸盘

摘要

A stage system includes a fine-motion stage on which a substrate holding member for holding a substrate is mounted, a rough-motion stage on which the fine-motion stage is mounted, a stage for supporting and moving a substrate, and a probe configured to measure a potential of the substrate without contact thereto, the probe being supported by the rough-motion stage so as to be opposed to one of a bottom face and a side face of the substrate.
机译:载物台系统包括:微动载物台,其上安装有用于保持基板的基板保持部件;粗动载物台,其上安装有该微动载物台;用于支撑和移动基板的载物台;以及探针,其被构造成为了在不接触衬底的情况下测量衬底的电势,探针由粗糙运动台支撑,以与衬底的底面和侧面之一相对。

著录项

  • 公开/公告号JP3748559B2

    专利类型

  • 公开/公告日2006-02-22

    原文格式PDF

  • 申请/专利权人 キヤノン株式会社;

    申请/专利号JP20030187432

  • 发明设计人 江本 圭司;伊藤 敦史;

    申请日2003-06-30

  • 分类号H01L21/027;G03F7/20;G03F9;

  • 国家 JP

  • 入库时间 2022-08-21 21:49:07

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