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How to quantify the uniformity pattern, include the expertise for the control and development of tools
How to quantify the uniformity pattern, include the expertise for the control and development of tools
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机译：如何量化均匀性模式，包括控制和开发工具的专业知识
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摘要
(For example, change process variables, hardware) to provide the improved system and method to correlate the changes in the quantified objectively and accurately present invention relates to non-uniformity, any associated in the system the non-uniformity . System and method for determining the uniformity measurement of a number of criteria [MEANS FOR SOLVING PROBLEMS] semiconductor wafer fabrication process includes the step of collecting the amount in each of the semiconductor wafer group. Quantity data collected is scaled, principal component analysis (PCA) is performed on the data amount that has been scaled and collected metrics set on the first semiconductor wafer of the first group is generated. Metric The first set includes a score matrix and the first load of the first matrix.
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