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Precision polishing composition, the polishing method of the Al alloy substrate electroless NiP plated film formed on the manufacturing method of the Al alloy substrate with an electroless NiP plating film

机译:精密抛光组合物,在具有化学镀NiP的铝合金基板的制造方法上形成的铝合金基底化学镀NiP的镀膜的抛光方法

摘要

PROBLEM TO BE SOLVED: To obtain a composition for polishing, capable of polishing a magnetic disc substrate, especially aluminum disc substrate used for memory device of computer, etc., into mirror plane having high precision and suitable for producing a magnetic disc substrate having high recording density. ;SOLUTION: This composition for precision polishing is used for polishing an electroless NiP plating film formed on an Al alloy substrate and the composition comprises water, α-alumina particles and a polishing promoter and, as the α-alumina particles, fine particle gibbsite is used as a raw material, or the alumina particles has 0.35-0.55μm average particle diameter (D50), or 90% particle diameter (D90) of the α alumina particles is ≤0.7μm, or maximum particle diameter (Dmax) of the α alumina particles is ≤1.4μm.;COPYRIGHT: (C)1997,JPO
机译:解决的问题:为了得到抛光用组合物,该抛光用组合物能够将磁盘基板,特别是用于计算机等的存储装置的铝盘基板研磨成高精度的镜面,并且适合于制造具有高水平的磁盘基板。记录密度。 ;解决方案:该用于精密抛光的组合物用于抛光在铝合金基材上形成的化学镀NiP镀膜,该组合物包含水,α-氧化铝颗粒和抛光促进剂,以及作为α-氧化铝颗粒的细颗粒。菱镁矿用作原料,或者氧化铝颗粒的平均粒径(D50)为0.35-0.55μm,或α的90%粒径(D90)。氧化铝颗粒为0.7μm,或α的最大粒径(Dmax)为0.7μm。氧化铝颗粒的尺寸为1.4μm.COPYRIGHT:(C)1997,JPO

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