首页> 外国专利> SEPARATION AND CONFINEMENT OF MENISCUS BY BARRIER WITH NON-AFFINITY

SEPARATION AND CONFINEMENT OF MENISCUS BY BARRIER WITH NON-AFFINITY

机译:非亲和力对垒的分离和限制

摘要

PROBLEM TO BE SOLVED: To provide an apparatus and a technique for efficiently supplying and removing a fluid to and from a wafer surface, while reducing contamination and the cost of processing wafers.;SOLUTION: In one of many embodiments, there is provided a method for processing a substrate. The method has a step of forming a first fluid meniscus and a second fluid meniscus on the surface of the substrate. At this time, the first fluid meniscus is approximately adjacent to the second fluid meniscus. Moreover, this meniscus has a step of separating the first fluid meniscus from the second fluid meniscus by a barrier.;COPYRIGHT: (C)2006,JPO&NCIPI
机译:解决的问题:提供一种装置和技术,用于有效地向晶片表面供应流体和从晶片表面去除流体,同时减少污染和处理晶片的成本。解决方案:在许多实施例之一中,提供了一种方法用于处理基板。该方法具有在衬底的表面上形成第一流体弯月面和第二流体弯月面的步骤。此时,第一流体弯液面与第二流体弯液面大致相邻。此外,该弯液面具有通过屏障将第一流体弯液面与第二流体弯液面分离的步骤。;版权所有:(C)2006,JPO&NCIPI

著录项

  • 公开/公告号JP2006041504A

    专利类型

  • 公开/公告日2006-02-09

    原文格式PDF

  • 申请/专利权人 LAM RES CORP;

    申请/专利号JP20050189340

  • 发明设计人 ODONNELL ROBERT J;ANDERSON THOMAS W;

    申请日2005-06-29

  • 分类号H01L21/304;H01L21/306;C23F1/24;

  • 国家 JP

  • 入库时间 2022-08-21 21:51:03

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