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METHOD OF DESIGNING CHARGED PARTICLE BEAM MASK, DESIGN DATA STRUCTURE, CHARGED PARTICLE BEAM MASK AND CHARGED PARTICLE BEAM TRANSFER METHOD
METHOD OF DESIGNING CHARGED PARTICLE BEAM MASK, DESIGN DATA STRUCTURE, CHARGED PARTICLE BEAM MASK AND CHARGED PARTICLE BEAM TRANSFER METHOD
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机译：带电粒子束模板的设计方法，设计数据结构，带电粒子束模板和带电粒子束传递方法
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摘要
PROBLEM TO BE SOLVED: To provide a method of designing a charged particle beam mask, its design data structure, a charged particle beam mask, and a charged particle beam transferring method which enable die-to-die comparison inspection in a mask defect inspection, when forming a plurality of identical chips on a single mask.;SOLUTION: The charged particle beam mask designing method calculates the number of sub-fields sufficient to cover the total size of a chip pattern, divides the mask into a plurality of mask regions, each corresponding to the sub-field unit based thereon, and forms chip patterns on the respective mask regions, thus obtaining a charged particle beam mask, composed of the plurality of identical chip patterns formed at pitches of a multiple integer of the sub-field size on the mask.;COPYRIGHT: (C)2006,JPO&NCIPI
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