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首页> 外国专利> Destruction of perfluoro and hydrofluorocarbon compounds in effluent gas, e.g. from semiconductor production, involves preconcentration, plasma treatment and removal of acid products

Destruction of perfluoro and hydrofluorocarbon compounds in effluent gas, e.g. from semiconductor production, involves preconcentration, plasma treatment and removal of acid products

机译：销毁废气中的全氟和氢氟烃化合物半导体生产过程中涉及到预浓缩，等离子体处理和酸性产品的去除

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In a method for the destruction of perfluoro compounds (PFC) and hydrofluorocarbon compounds (HFC) in effluent gas by plasma treatment, the effluent is preconcentrated to a PFC/HFC content of 5000 ppmv to 5 vol% before plasma treatment, which may be followed if necessary by treatment to remove certain conversion products, especially acids. A method for the destruction of gaseous perfluoro compounds (PFC) and/or hydrofluorocarbon compounds (HFC) in gaseous effluents by injecting the effluent into a plasma so as to break the bonds between fluorine and other elements with the formation of different fluorine compounds such as COF2, SO2F2, SOF4, F2, HF etc. The method involves preconcentration of the effluent to a PFC/HFC content of 5000 ppmv to 5 vol% before plasma treatment, after which the plasma-treated gas may if necessary be injected into a medium for eliminating certain species in the gas, especially acids. An independent claim is also included for apparatus for use in the above method (preferably using plasma with a high flux density) which also includes a preconcentration unit to produce the above mixture for injection.
机译：在通过等离子体处理破坏废气中的全氟化合物（PFC）和氢氟碳化合物（HFC）的方法中，在进行等离子体处理之前，将废水预浓缩至5000 ppmv至5 vol％的PFC / HFC含量。必要时通过处理除去某些转化产物，尤其是酸。一种通过将废气注入等离子体中以破坏氟与其他元素之间的键合并形成不同的氟化合物的方式来破坏废气中的气态全氟化合物（PFC）和/或氢氟碳化合物（HFC）的方法COF2，SO2F2，SOF4，F2，HF等。该方法包括在等离子处理之前将废水预浓缩至5000 ppmv的PFC / HFC含量为5 vol％，然后，如有必要，可以将经等离子处理的气体注入介质中用于消除气体中的某些物质，尤其是酸。对于在上述方法中使用的设备（最好使用具有高通量密度的等离子体），也包括一个独立的权利要求，该设备还包括一个预浓缩单元，以生产上述注射用混合物。

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