首页> 外国专利> Method of detecting and preventing regions critical for etching, e.g. for screen printing plate manufacture - involves accessing data structures of layout and configuration elements in plane of layout, detecting critical regions between configuration elements, altering, displaying regions

Method of detecting and preventing regions critical for etching, e.g. for screen printing plate manufacture - involves accessing data structures of layout and configuration elements in plane of layout, detecting critical regions between configuration elements, altering, displaying regions

机译:检测和防止对蚀刻至关重要的区域的方法用于丝网印刷板制造-涉及在布局平面中访问布局和配置元素的数据结构,检测配置元素之间的关键区域,更改,显示区域

摘要

The method involves accessing data structures of a layout, accessing data structures of configuration elements (A-C) in a plane of the layout, detecting critical regions (X,Y,Z,K1,K2) between the configuration elements according to programme procedures, altering the regions and displaying them. Alterations are performed to prevent under etching and the altered regions are integrated into the existing data structure for the layout.
机译:该方法包括访问布局的数据结构,访问布局平面中的配置元素(AC)的数据结构,根据程序过程检测配置元素之间的关键区域(X,Y,Z,K1,K2),区域并显示它们。进行改变以防止蚀刻不足,并且改变的区域被集成到用于布局的现有数据结构中。

著录项

  • 公开/公告号DE29924723U1

    专利类型

  • 公开/公告日2005-08-04

    原文格式PDF

  • 申请/专利权人 SIEMENS AG;

    申请/专利号DE1999224723U

  • 发明设计人

    申请日1999-09-29

  • 分类号H05K3/00;H05K3/06;

  • 国家 DE

  • 入库时间 2022-08-21 22:00:03

相似文献

  • 专利
  • 外文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号