首页>
外国专利>
Method for approximation of two measuring processes of tapering structure widths on substrate for obtaining mutually comparable values
Method for approximation of two measuring processes of tapering structure widths on substrate for obtaining mutually comparable values
展开▼
机译：为获得相互可比较的值而对两个在基板上逐渐变细的结构宽度的测量过程进行近似的方法
展开▼
页面导航
摘要
著录项
相似文献
摘要
Both measuring processes contain respective steps, i.e. measuring first structure width (XCO(1)) of test structure by first measuring process at preset, adjustable height (h1). At least one further parameter is determined by first process to describe fully trapezoidal shape. Then second structure width (XCD(2)) is measured by second process. Second height (h2) is determined front above process results. Then follows adjustment of first height of first process to value of second height to approximate first process to second one.
展开▼
