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AN INSTRUMENT AND METHODOLOGY FOR ACQUIRING A CONTOUR DEPENDING ON THIN FILM THICKNESS IN A THIN FILM THICKNESS MEASUREMENT SYSTEM USING OPTICAL INTERFERENCE
AN INSTRUMENT AND METHODOLOGY FOR ACQUIRING A CONTOUR DEPENDING ON THIN FILM THICKNESS IN A THIN FILM THICKNESS MEASUREMENT SYSTEM USING OPTICAL INTERFERENCE
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机译：在光学厚度测量系统中获取与薄膜厚度有关的轮廓的仪器和方法
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摘要
Instrument and a method for obtaining contour line depending on a thin film thickness in a thin film thickness measurement system using optical interference are provided to reduce an error range occurring in measurement by integrally measuring the thickness of a multi-layer thin film and a refractive index of the multi-layer thin film. A light part(501) and a dark part(502) on an image form one contour line due to light intensity. When a thin film on a fine area has not the same thickness, the thickness of the thin film is measured by using interference according to wavelengths and then two-dimensional thickness map is formed by the measurement value. The two-dimensional thickness map is obtained by calculating brightness based on constructive interference and destructive interference.
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