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MULTI-LAYER THIN FILM STRUCTURE OF PLASMA DISPLAY PANEL FILTER CAPABLE OF MINIMIZING REFLECTION RATIO OVER WIDE WAVELENGTH RANGE EVEN IN CASE WHERE METAL THIN FILM IS DEPOSITED IN TWO TIMES
MULTI-LAYER THIN FILM STRUCTURE OF PLASMA DISPLAY PANEL FILTER CAPABLE OF MINIMIZING REFLECTION RATIO OVER WIDE WAVELENGTH RANGE EVEN IN CASE WHERE METAL THIN FILM IS DEPOSITED IN TWO TIMES
PURPOSE: A multi-layer thin film structure of a plasma display panel filter is provided to simplify manufacturing procedures and improve total reflection ratio by depositing a metal thin film in two times. CONSTITUTION: A multi-layer thin film structure comprises a first high refractive transparent thin film, a first metal thin film, a second high refractive transparent thin film, a second metal thin film, and a third high refractive transparent thin film which are sequentially coated on a transparent substrate(15). The first high refractive transparent thin film includes a first Nb2O5 layer(41) and a first ITO layer(42). The first metal thin film includes a first Ag layer(43). The second high refractive transparent thin film includes a second ITO layer(44), a second Nb2O5 layer(45), and a third ITO layer(46). The second metal thin film includes a second Ag layer(47). The third high refractive transparent thin film includes a fourth ITO layer(48) and a third Nb2O5 layer(49). The thickness of the second high refractive transparent thin film is larger than the sum of the thickness of the first high refractive transparent thin film and the third high refractive transparent thin film.
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机译：目的：提供一种等离子体显示面板滤光片的多层薄膜结构，以简化制造程序并通过两次沉积金属薄膜来提高全反射率。构成：一种多层薄膜结构，包括依次涂覆的第一高折射透明薄膜，第一金属薄膜，第二高折射透明薄膜，第二金属薄膜和第三高折射透明薄膜在透明基板（15）上。第一高折射透明薄膜包括第一Nb 2 O 5层（41）和第一ITO层（42）。第一金属薄膜包括第一Ag层（43）。第二高折射透明薄膜包括第二ITO层（44），第二Nb 2 O 5层（45）和第三ITO层（46）。第二金属薄膜包括第二Ag层（47）。第三高折射透明薄膜包括第四ITO层（48）和第三Nb 2 O 5层（49）。第二高折射透明薄膜的厚度大于第一高折射透明薄膜和第三高折射透明薄膜的厚度之和。
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