TFT FABRICATION METHOD FOR LOCALLY CRYSTALLIZING A-SI THIN FILM BY APPLYING EXCIMER LASER ANNEALING CRYSTALLIZATION METHOD TO FLEXIBLE SUBSTRATE

• 1. 激光结晶系统和控制准分子激光退火制程能量密度的方法 [P] . 中国专利： CN1290154C . 2006.12.13
• 2. 激光结晶系统和控制准分子激光退火制程能量密度的方法 [P] . 中国专利： CN1553477A . 2004-12-08
• 3. LASER CRYSTALLIZATION SYSTEM, LASER CRYSTALLIZATION METHOD AND FABRICATION METHOD FOR THIN FILM TRANSISTOR SUBSTRATE OF LIQUID CRYSTAL DISPLAY [P] . 韩国专利： KR20060131518A . 2006-12-20

  机译： 液晶显示的薄膜晶体管薄膜的激光晶化系统，激光晶化方法和制备方法

• 4. LASER CRYSTALLIZATION SYSTEM CAPABLE OF UNIFORMLY FORMING THE SIZE OF A CRYSTAL PARTICLE, A LASER CRYSTALLIZATION METHOD, AND A METHOD FOR MANUFACTURING A THIN FILM TRANSISTOR SUBSTRATE USING THE SAME [P] . 韩国专利： KR20120062474A . 2012-06-14

  机译： 能够均匀地形成晶体颗粒尺寸的激光晶体化系统，激光晶体化方法以及使用相同的薄膜晶体管基体的制造方法

• 5. LASER ANNEALING APPARATUS AND METHOD OF CRYSTALLIZING THIN FILM USING LASER ANNEALING APPARATUS [P] . KR20210022215A . 2021-03-03

  机译： 使用激光退火装置将薄膜结晶的激光退火装置和方法

• 1. Laser Crystallization of Thin a-Si Films on Plastic Substrates Using Excimer Laser Treatments [C] . M.D. Efremov, V.A. Volodin, L.I. Fedina, International autumn meeting on gettering and defect engineering in semiconductor technology . 2004
• 2. Probing the Crystallization Process and Morphology of Thin Films of Yttrium Iron Garnet on Non-garnet Substrates with in situ TEM Methods [D] . Gage, Thomas E. 2018
• 3. Electrical and Structural Characteristics of Excimer Laser-Crystallized Polycrystalline Si1−xGex Thin-Film Transistors [O] . Kyungsoo Jang, Youngkuk Kim, Joonghyun Park, 2019
• 4. Nano-crystallization in ZnO-doped In2O3 thin films via excimer laser annealing for thin-film transistors [O] . Mami N. Fujii, Yasuaki Ishikawa, Ryoichi Ishihara, 2016
• 5. Excimer Laser Crystallization of Silicon Films: Artificially-Controlled Super Lateral Growth for Grain Boundary Location-Controlled and Single Crystal Island Materials for Thin Film Transistor Applications [R] . Im, J. S. , Sposili, R. S. 1998

• 1. Crystallization and Morphology of Gold Thin Films on Unpolished Si（100） Substrates after Furnace and Flame Annealing [J] . Luis De Los Santos V ,Angel Bustamante D. ,Liz . 材料科学与工程：中英文版 . 2010,第001期
• 2. Poly-Si Thin Film Grown by Excimer Laser Crystallization and Its Ellipsometric Analysis [J] . ZENGXiang－bin ,XUZhong－yang ,等 . 半导体光子学与技术：英文版 . 2000,第2期
• 3. Fabrication of Poly-Si Thin Film on Glass Substrate by Aluminum-induced Crystallization [J] . 徐慢 ,赵修建 . 武汉理工大学学报：材料科学英文版 . 2006,第2期
• 4. Effect of crystallization temperature on microstructure and ferroelectric property of Bi_(3.25)Eu_(0.75)Ti_3O_(12) thin films prepared by MOD method [J] . 何林 ,张彤 ,唐明华 . 中国有色金属学会会刊：英文版 . 2006,第5期
• 5. Development of a High-PerformanceFlexible Substrate for Flexible Electronics:Joining TAC Films and an Ultra-Thin Glassby Using TEOS-DAC Synthesized by the Sol-Gel Method [J] . Tomoji Ohishi ,Hiroaki Kawada ,Tsutomu Yoshida . 材料科学与应用期刊（英文） . 2015,第12期
• 6. 用先进的模拟方法来研究结晶器电磁搅拌对多相流状况的影响 [C] . Oliver Pütz ,Ralph Striedinger ,Sigurd Rodl . 第一届中德(欧)冶金技术研讨会 . 2004
• 7. 基于柔性衬底的非晶硅（a-Si）薄膜晶体管（TFT）制备技术的研究 [A] . 邓耀华 . 2007