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SELECTIVE ETCHING SOLUTION COMPOSITION CONTAINING HCL, ACETIC ACID AND CORROSION INHIBITOR FOR PATTERN ETCHING OF ITO OR IZO TRANSPARENT LAYER FOR FLAT PANEL DISPLAY
SELECTIVE ETCHING SOLUTION COMPOSITION CONTAINING HCL, ACETIC ACID AND CORROSION INHIBITOR FOR PATTERN ETCHING OF ITO OR IZO TRANSPARENT LAYER FOR FLAT PANEL DISPLAY
PURPOSE: An etching solution composition for the pattern etching of the ITO or IZO layer for a flat panel display is provided, to prevent aluminum or aluminum-neodymium alloy from being etched, thereby improving production yield. CONSTITUTION: The etching solution composition comprises 0.5-15 wt% of HCl, 0.5-15 wt% of acetic acid, 0.5-15 wt% of a corrosion inhibitor, and the balance of water. Preferably the corrosion inhibitor is a sulfate.
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