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Reflectance measurement devices, temperature measuring device and the substrate heat treatment apparatus and reflectance measurement method, temperature measurement method and substrate heat treatment method
Reflectance measurement devices, temperature measuring device and the substrate heat treatment apparatus and reflectance measurement method, temperature measurement method and substrate heat treatment method
PROBLEM TO BE SOLVED: To accurately measure the reflectivity of a substrate by acquiring a substrate reflectivity (substrate emissivity) based on on-time intensity signal and off-time intensity signal which are switched between turned-on state and turned-off state. ;SOLUTION: An auxiliary lamp 572c is always turned on, and, with a rotative sector for switching effective reflectivity R1 and R2 provided, an auxiliary sector 572a for switching the light-emission from the upper end of an optical fiber 56b between turned-on state and turned-off state, is rotated. A detection part 571 measures emission intensities I0, I1, and IL. A reflectivity pW of a process substrate W is calculated from the emission intensities I0, I1, and IL, and further, effective reflectivity R1 and R2 are acquired using a conversion table corresponding to this kind of a process substrate W acquired already, from the reflectivity W. Then the process substrate W is thermally processed. Here, a temperature T of the process substrate W is calculated using measured emission intensities I1 and I2 as well as acquired effective reflectivity R1 and R2, and a control part 60 controls a lamp based on the temperature T for temperature-control the substrate W.;COPYRIGHT: (C)2000,JPO
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