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Includes the production mannered null optical euphotic zone of the semiconductor

机译:包括半导体的生产合理的零光学富光区

摘要

PROBLEM TO BE SOLVED: To provide a method of manufacturing a semiconductor photo-detector which easily permits an optical coupling with a fiber at a high accuracy, and photo-detector device using the same about a refraction type photo-detector or waveguide type photo-detector. SOLUTION: A refraction type semiconductor photo-detector, comprising a photo-detector part composed of a semiconductor multilayer structure including a photo detection layer 13, and a light incident end face 11 inclined inwards away from the surface to refract an incident light at the incident end face 11, so as to make the incident light passing through the photo detection layer 13 obliquely in the layer thickness direction and a V- or U-shaped groove facing the incident end face 11, is constituted that the light incident end face part and its vicinity are filled with an org. material 19.
机译:解决的问题:提供一种制造半导体光检测器的方法,该方法容易地实现与光纤的光学高精度耦合,以及关于折射式光检测器或波导型光检测器的使用该光检测器的装置。探测器。解决方案:折射型半导体光电探测器,包括由半导体多层结构组成的光电探测器部分,该半导体多层结构包括光电检测层13和从表面向内倾斜以使入射光折射的光入射端面11端面11构成为:使入射光在层厚度方向上倾斜地通过光检测层13,并且,与入射端面11相对的V字状或U字状的槽构成为:其附近充满了组织。材料19。

著录项

  • 公开/公告号JP3608763B2

    专利类型

  • 公开/公告日2005-01-12

    原文格式PDF

  • 申请/专利权人 日本電信電話株式会社;

    申请/专利号JP19980008236

  • 发明设计人 深野 秀樹;

    申请日1998-01-20

  • 分类号H01L31/10;

  • 国家 JP

  • 入库时间 2022-08-21 22:27:44

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