首页> 外国专利> METHOD FOR DETECTING FOREIGN MATTER BETWEEN SUBSTRATES, NEAR FIELD EXPOSING METHOD, DETECTOR OF FOREIGN MATTER BETWEEN SUBSTRATES AND NEAR FIELD EXPOSURE DEVICE

METHOD FOR DETECTING FOREIGN MATTER BETWEEN SUBSTRATES, NEAR FIELD EXPOSING METHOD, DETECTOR OF FOREIGN MATTER BETWEEN SUBSTRATES AND NEAR FIELD EXPOSURE DEVICE

机译:基板间异物的检测方法,近场曝光方法,基板间异物的检测器及近场曝光装置

摘要

PROBLEM TO BE SOLVED: To provide a method for detecting foreign matter between substrates constituted so as to enhance a yield by detecting the foreign matter present between the substrates, and to provide a near field exposing method, a detector of the foreign matter between the substrates and a near field exposure device.;SOLUTION: For example, this detection means of the foreign matter between the substrates is adapted to the near field exposing method, which is constituted so as to deform an exposure mask to bring the same into close contact with an object 106 to be treated to perform exposure using the near field bleeding out of the fine opening formed to the exposure mask, or the near field exposure device therefor. This detection means has a means 103 for bringing the exposure mask into close contact with the object to be treated and a means 110 for detecting the deformation of the exposure mask produced by the foreign matter 111 present between the exposure mask and the object to be treated to be bonded to them.;COPYRIGHT: (C)2005,JPO&NCIPI
机译:解决的问题:提供一种用于检测基板之间的异物的方法,该方法通过检测基板之间存在的异物来提高产量,并且提供一种近场曝光方法,即基板之间的异物的检测器。解决方案:例如,该基板之间异物的检测装置适用于近场曝光方法,该方法构造成使曝光掩模变形以使其与曝光掩模紧密接触。使用被形成在曝光掩模上的微细​​开口中的近场渗出的被处理物体106或用于其的近场曝光装置来进行曝光。该检测装置具有用于使曝光掩模与被处理物紧密接触的装置103和用于检测由存在于曝光掩模与被处理物之间的异物111产生的曝光掩模的变形的装置110。绑定到它们。;版权所有:(C)2005,JPO&NCIPI

著录项

  • 公开/公告号JP2005062035A

    专利类型

  • 公开/公告日2005-03-10

    原文格式PDF

  • 申请/专利权人 CANON INC;

    申请/专利号JP20030293694

  • 发明设计人 INAO YASUHISA;KURODA AKIRA;

    申请日2003-08-15

  • 分类号G01N21/956;G01B11/30;H01L21/027;

  • 国家 JP

  • 入库时间 2022-08-21 22:28:33

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