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POSITION DETECTING MARK AND RETICLE OR SENSITIVE SUBSTRATE EQUIPPED THEREWITH, POSITION DETECTING METHOD, MARK EVALUATING METHOD, MARK DETECTING METHOD AND MARK DETECTING DEVICE, EXPOSING METHOD AND EXPOSURE DEVICE
POSITION DETECTING MARK AND RETICLE OR SENSITIVE SUBSTRATE EQUIPPED THEREWITH, POSITION DETECTING METHOD, MARK EVALUATING METHOD, MARK DETECTING METHOD AND MARK DETECTING DEVICE, EXPOSING METHOD AND EXPOSURE DEVICE
PROBLEM TO BE SOLVED: To provide a mark for detecting a position, which is capable of detecting a position with a good accuracy even when a detecting condition or the like is different.;SOLUTION: The mark AM for detecting position provided on a substrate P and employed for detecting a position in the X-axis direction of the substrate P is arranged in a first region 1 having a first width W1 in the X-axis direction, and a second region 2 arranged at a position different from the first region 1 and having a second region 2 having a second width W2 different from the first width W1 in the X-axis direction. The first region 1 is provided with a first zone L1 whose first width W1 in the X-axis direction is continued in Y-axis direction, and the second region 2 is provided with a second zone L2 whose second width W2 in the X-axis direction is continued in the Y-axis direction while the value of a positional information on a center in the X-axis direction of a first zone L1 and the value of positional information of a center in the X-axis direction of a second zone L2 are set respectively so as to be the same value on the value of designing.;COPYRIGHT: (C)2006,JPO&NCIPI
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