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PROBE FOR PLASMA DENSITY INFORMATION MEASUREMENT, MOUNTING FIXTURE FOR PLASMA DENSITY INFORMATION MEASUREMENT, PLASMA DENSITY INFORMATION MEASUREMENT METHOD, ITS DEVICE, PLASMA TREATMENT METHOD AND ITS DEVICE
PROBE FOR PLASMA DENSITY INFORMATION MEASUREMENT, MOUNTING FIXTURE FOR PLASMA DENSITY INFORMATION MEASUREMENT, PLASMA DENSITY INFORMATION MEASUREMENT METHOD, ITS DEVICE, PLASMA TREATMENT METHOD AND ITS DEVICE
PROBLEM TO BE SOLVED: To provide a probe for plasma density information measurement capable of preventing abnormal discharge to stably implement a process.;SOLUTION: When this measurement probe 7 is inserted into a chamber 1 in order to measure plasma density information, one end (tip) 17a on the insertion side of a dielectric member 17 is formed into a planar shape so that the one end 17a is nearly flush with an inside wall 1b of the chamber 1 in the insertion part; and the measurement probe 7 is equipped with a circumferential surface with a first conductor 18 covering the dielectric member brought into contact with the inside wall of an insertion hole 1A of the chamber 1 so as to fit the measurement probe 7 to the insertion hole 1A. By structuring the probe like that, the insertion hole 1A is closed by the circumferential surface of the first conductor 18 in insertion; abnormal discharge can be eliminated by preventing an electric field in the chamber 1 from flowing through the outside wall 1a of the chamber 1 through the insertion hole 1A; and the process can be stably implemented without hindering processes such as measurement of plasma density information and plasma treatment.;COPYRIGHT: (C)2005,JPO&NCIPI
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