首页> 外国专利> OPTICAL CHARACTERISTIC MEASURING APPARATUS OF SCANNING OPTICAL SYSTEM, METHOD OF CALIBRATING OPTICAL CHARACTERISTIC MEASURING APPARATUS OF SCANNING OPTICAL SYSTEM, SCANNING OPTICAL SYSTEM AND IMAGE FORMING APPARATUS

OPTICAL CHARACTERISTIC MEASURING APPARATUS OF SCANNING OPTICAL SYSTEM, METHOD OF CALIBRATING OPTICAL CHARACTERISTIC MEASURING APPARATUS OF SCANNING OPTICAL SYSTEM, SCANNING OPTICAL SYSTEM AND IMAGE FORMING APPARATUS

机译：扫描光学系统的光学特征测量装置，校准扫描光学系统的光学特征测量装置的方法，扫描光学系统和图像形成装置

页面导航

摘要
著录项
相似文献

摘要

PPROBLEM TO BE SOLVED: To solve the problem that such errors as pitching and yawing of a movable stage directly reduce measurement accuracy and the variation in temperature condition due to a time deviation caused by the movement of the stage reduces the measurement accuracy. PSOLUTION: In an optical characteristic measuring apparatus of scanning optical system, in which the position of a scanning line in a main scanning direction on an image plane with a light beam with a scanning optical system unit 6 with which at least either of writing-in or readout is performed by scanning the image plane with the light beam, is measured with photosensors 7 having a plurality of light receiving elements arranged in a subscanning direction or a photosensor which detects the position of the scanning line, the photosensors 7 are at least three or more fixed photosensors arranged in image height direction matching with the image plane. A plurality of subscanning positions on the image plane with the light beam are measured with the photosensors 7. PCOPYRIGHT: (C)2005,JPO&NCIPI

机译：

要解决的问题：解决可移动平台的俯仰和偏航等误差直接降低测量精度，以及由于平台移动引起的时间偏差导致的温度条件变化会降低测量精度的问题。

解决方案：在扫描光学系统的光学特性测量设备中，其中扫描线在图像平面上的主扫描方向上的位置具有光束，而扫描光学系统单元6至少利用其中之一写入或读出是通过用光束扫描图像平面来进行的，是用在副扫描方向上排列有多个光接收元件的光传感器7或检测扫描线位置的光传感器来测量的。在像高方向上排列的至少三个或更多固定光电传感器与像平面匹配。用光传感器7测量在图像平面上具有光束的多个副扫描位置。

版权：（C）2005，JPO＆NCIPI 展开▼

著录项

公开/公告号JP2005234359A

专利类型
公开/公告日2005-09-02

原文格式PDF
申请/专利权人 RICOH CO LTD;
展开▼

申请/专利号JP20040045023
发明设计人 SHIMIZU KENICHI;
展开▼

申请日2004-02-20
分类号G02B26/10;G01B11/00;G01M11/02;H04N1/036;H04N1/113;H04N1/19;
国家 JP
入库时间 2022-08-21 22:33:14

相似文献

专利
外文文献
中文文献