USE OF DEUTERATED GASES FOR THE VAPOR DEPOSITION OF THIN FILMS FOR LOW-LOSS OPTICAL DEVICES AND WAVEGUIDES

• 1. 气体注入单元和使用该气体注入单元的薄膜气相沉积设备及方法 [P] . 中国专利： CN102687242A . 2012-09-19
• 2. 一价铜化合物及使用该类化合物进行化学气相沉积制备铜薄膜的方法 [P] . 中国专利： CN101748376B . 2011.10.05
• 3. USE OF DEUTERATED GASES FOR THE VAPOR DEPOSITION OF THIN FILMS FOR LOW-LOSS OPTICAL DEVICES AND WAVEGUIDES [P] . 欧洲知识产权局专利： EP1425615A4 . 2009-09-16

  机译： 使用氘化气体对低损耗光学器件和波导的薄膜进行气相沉积

• 4. Use of deuterated gases for the vapor deposition of thin films for low-loss optical devices and waveguides [P] . 美国专利： US6771868B2 . 2004-08-03

  机译： 使用氘化气体气相沉积低损耗光学器件和波导的薄膜

• 5. Use of deuterated gases for the vapor deposition of thin films for low-loss optical devices and waveguides [P] . 美国专利： US6614977B2 . 2003-09-02

  机译： 使用氘化气体气相沉积低损耗光学器件和波导的薄膜

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• 5. Low-Loss Optical Waveguides for the Near Ultra-Violet and Visible Spectral Regions with Al2O3 Thin Films from Atomic Layer Deposition [O] . Mustafa M. Aslan, Nathan A. Webster, Courtney L. Byard, -1
• 6. Zn1-xMgxO thin films deposited by original infrared assisted spray chemical vapor deposition: evaluation of structural, optical and electrical properties with the aim of provide Cu(In,Ga)Se2 based photovoltaic devices [O] . V. Froger, S. Dabos, S. Noël, 2014
• 7. Atmospheric Pressure Chemical Vapor Deposition and Jet Vapor Deposition of CdTe for High Efficiency Thin Film PV Devices [R] . Woods, L., Meyers, P. 2002

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• 3. Influence of Bath Temperature, Deposition Time and S/Cd Ratio on the Structure, Surface Morphology, Chemical Composition and Optical Properties of CdS Thin Films Elaborated by Chemical Bath Deposition [J] . F. Ouachtari ,A. Rmili ,B. Elidrissi . 现代物理（英文） . 2011,第9期
• 4. 三乙醇胺铜配合物-PVA复合薄膜K+离子交换玻璃光波导器件检测SO2气体 [C] . 麦麦提依明·马合木提 ,海日沙·阿不来提 ,阿布力孜·伊米提 . 第十届全国化学传感器学术会议 . 2008
• 5. 铌酸锂单晶薄膜上加载条型波导和集成光学器件的研究 [A] . 王羿文 . 2019