LOW TEMPERATURE DEPOSITION OF SILICON BASED THIN FILMS BY SINGLE-WAFER HOT-WALL RAPID THERMAL CHEMICAL VAPOR DEPOSITION

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  机译： 单晶片热壁快速热化学气相沉积法低温沉积硅基薄膜

• 4. LOW TEMPERATURE DEPOSITION OF SILICON BASED THIN FILMS BY SINGLE-WAFER HOT-WALL RAPID THERMAL CHEMICAL VAPOR DEPOSITION [P] . 世界知识产权组织专利： WO2004023525A2 . 2004-03-18

  机译： 单晶片热壁快速热化学气相沉积法低温沉积硅基薄膜

• 5. LOW TEMPERATURE DEPOSITION OF SILICON BASED THIN FILMS BY SINGLE-WAFER HOT-WALL RAPID THERMAL CHEMICAL VAPOR DEPOSITION [P] . 世界知识产权组织专利： WO2004023525A3 . 2004-07-08

  机译： 单晶片热壁快速热化学气相沉积法低温沉积硅基薄膜

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