首页> 外国专利> Photosensitive solution for depositing metal on an insulating substrate comprises an iron(III) compound, a metal salt, a water-soluble film-forming polymer, a complexing agent and a solvent

Photosensitive solution for depositing metal on an insulating substrate comprises an iron(III) compound, a metal salt, a water-soluble film-forming polymer, a complexing agent and a solvent

机译:用于在绝缘基板上沉积金属的光敏溶液,包括铁(III)化合物,金属盐,水溶性成膜聚合物,络合剂和溶剂

摘要

Photosensitive solution for depositing metal on an insulating substrate comprises an iron (III) compound, a metal salt, a water-soluble film-forming polymer, a complexing agent and a solvent selected from water, ethanol, isopropanol, butanol and acetone. Independent claims are also included for: (a) depositing metal on an insulating substrate by applying the above solution in the form of a film, drying the film and irradiating the film with UV and/or laser radiation at a wavelength of 190-450 nm and a power of 25-100 mJ/cm2; (b) depositing metal on an insulating substrate by applying a solution containing an iron (III) compound and a water-soluble film-forming polymer in the form of a film, drying the film, irradiating the film as above and dipping the substrate in a solution containing a metal salt and complexing agent.
机译:用于在绝缘基板上沉积金属的光敏溶液包括铁(III)化合物,金属盐,水溶性成膜聚合物,络合剂和选自水,乙醇,异丙醇,丁醇和丙酮的溶剂。还包括以下独立权利要求:(a)通过以膜的形式施加上述溶液,干燥膜并用波长为190-450 nm的UV和/或激光辐射照射膜,从而在绝缘基板上沉积金属功率为25-100 mJ / cm2>; (b)通过以膜的形式施加包含铁(III)化合物和水溶性成膜聚合物的溶液,在膜上沉积金属,干燥膜,如上所述地辐照膜并将膜浸入绝缘膜中。含有金属盐和络合剂的溶液。

著录项

  • 公开/公告号BE1014795A3

    专利类型

  • 公开/公告日2004-04-06

    原文格式PDF

  • 申请/专利权人 BLUE CHIPS HOLDING;

    申请/专利号BE20020000278

  • 发明设计人

    申请日2002-04-23

  • 分类号C23C18/14;

  • 国家 BE

  • 入库时间 2022-08-21 23:12:24

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