Glow discharge plasma processor and glow discharge plasma processing method
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机译:辉光放电等离子体处理器和辉光放电等离子体处理方法
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摘要
Topic The stationary glow discharge plasma is generated under atmospheric pressure and under low temperature. Constitution Porous metal layer is installed in one among the electrodes of the plasma processing system. The plasma vapor under atmospheric pressure is filled substantially to this electrode, it passes by porous layer and it is possible to spread, the uniform glow discharge plasma is formed with this. The 2nd electrode which the material which it should process is disclosed to the plasma which occurs with this electrode and by dielectric layer is covered. The steady state glow discharge plasma under atmospheric pressure, occurs at the power source frequency whose in addition 60Hz is low. This invention according to one feature already, it evaporates the substance which becomes the object, mixes this with the plasma vapor, it evaporates combining with plasma processing by spreading this blend via the porous electrode.
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