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PATTERN FORMING METHOD, MANUFACTURING OF MAGNETORESISTANCE EFFECT ELEMENT AND MAGNETIC HEAD USING METHOD, AND HEAD SUSPENSION ASSEMBLY AND MAGNETIC DISK UNIT
PATTERN FORMING METHOD, MANUFACTURING OF MAGNETORESISTANCE EFFECT ELEMENT AND MAGNETIC HEAD USING METHOD, AND HEAD SUSPENSION ASSEMBLY AND MAGNETIC DISK UNIT
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机译：图案形成方法，磁阻效应元件的制造和磁头的使用方法，以及磁头悬挂组件和磁碟单元
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摘要
PROBLEM TO BE SOLVED: To eliminate any unnecessary formation left behind on the peripheral part or the like of a patterned film which is cleaned by dry etching by using a resist pattern for lift-off as a mask.;SOLUTION: A pattern forming method forms a resist pattern for lift-off on a first film constituted of a plurality of layers 23-28 which are formed on a substrate 101. The first film is subjected to patterning by dry etching by using the resist pattern as a mask. After that, a second film 30 is formed in the state that the resist pattern exists on the first film. A substrate 101 in this state is etched. This etching stage includes a stage wherein the incident angle of etching particles is set at least 60° and at most 90° with respect to the normal line direction of the substrate 101, and dry etching is performed.;COPYRIGHT: (C)2004,JPO&NCIPI
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