首页> 外国专利> SOLID CARBON BASED EVAPORATION SOURCE, EVAPORATION SOURCE, CARBON BASED THIN FILM DEPOSITION METHOD, AND CARBON BASED THIN FILM DEPOSITION SYSTEM

SOLID CARBON BASED EVAPORATION SOURCE, EVAPORATION SOURCE, CARBON BASED THIN FILM DEPOSITION METHOD, AND CARBON BASED THIN FILM DEPOSITION SYSTEM

机译:固体碳蒸发源,蒸发源,碳薄膜沉积方法和碳薄膜沉积系统

摘要

PROBLEM TO BE SOLVED: To provide a solid carbon based evaporation source which does not require not only equipment for a solid carbon based vapor deposition source but also equipment for the other evaporation source at the time when a plurality of thin film layers including carbon based thin films are stacked to deposit on a substrate.;SOLUTION: The solid carbon based evaporation source is obtained by providing a part of the evaporation face in a solid carbon based evaporation source with a recessed part for the other evaporation source.;COPYRIGHT: (C)2005,JPO&NCIPI
机译:解决的问题:提供一种固态碳基蒸发源,当包括碳基薄层的多个薄膜层时,该固态碳基蒸发源不仅不需要用于固态碳基气相沉积源的设备,而且还需要用于另一蒸发源的设备。薄膜:堆积在基材上。;解决方案:通过在固态碳基蒸发源中的一部分蒸发面提供用于另一种蒸发源的凹陷部分来获得固态碳基蒸发源。 )2005,日本特许厅

著录项

  • 公开/公告号JP2004292849A

    专利类型

  • 公开/公告日2004-10-21

    原文格式PDF

  • 申请/专利权人 ULVAC JAPAN LTD;

    申请/专利号JP20030083621

  • 发明设计人 NOZUE TATSUHIRO;INAGAWA KONOSUKE;

    申请日2003-03-25

  • 分类号C23C14/32;C23C14/06;

  • 国家 JP

  • 入库时间 2022-08-21 23:35:32

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