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Recovery of hydrogen chloride, used directly as raw material e.g. in chlorosilane production, involves cooling waste gas from organosilane ester production from chlorosilane and alcohol and/or glycol without condensing hydrogen chloride
Recovery of hydrogen chloride, used directly as raw material e.g. in chlorosilane production, involves cooling waste gas from organosilane ester production from chlorosilane and alcohol and/or glycol without condensing hydrogen chloride
Purification of waste gas containing hydrogen chloride (HCl) from the reaction of a chlorosilane (I) with alcohol and/or glycol compound(s) (II) for production of organosilane esters (III) involves recovering HCl by treatment of the waste gas at -1 to -85 degrees C Purification of waste gas containing hydrogen chloride (HCl) from the reaction of a chlorosilane of formula RnSiCl4-n (I) with alcohol and/or glycol compound(s) (II) for production of organosilane esters (III) involves recovering HCl by treatment of the waste gas at -1 to -85 degrees C; R = H, 3-halopropyl, 2-haloethyl or 4-halobutyl (where halo is chloro, bromo, iodo or fluoro), chloroaryl, chlorobenzyl or a linear, branched or cyclic 1-30 C alkyl group or 1-30 C aralkyl group; n = 1 or 2.
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机译：从氯硅烷（I）与一种或多种醇和/或二醇化合物（II）的反应中纯化含氯化氢（HCl）的废气，以生产有机硅烷酯（III）的过程包括通过在90℃下处理废气来回收HCl -1至-85摄氏度，从式RnSiCl4-n（I）的氯硅烷与醇和/或乙二醇化合物（II）的反应中提纯的含氯化氢（HCl）的废气，用于生产有机硅烷酯（ III）涉及通过在-1至-85℃下处理废气来回收HCl; R = H，3-卤代丙基，2-卤代乙基或4-卤代丁基（其中卤代是氯，溴，碘或氟），氯芳基，氯苄基或直链，支链或环状的1-30 C烷基或1-30 C芳烷基组; n = 1或2。
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