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MICROFABRICATION PROCESS FOR ELECTROSPRAY IONIZATION MASS SPECTROMETRY EMITTERS
MICROFABRICATION PROCESS FOR ELECTROSPRAY IONIZATION MASS SPECTROMETRY EMITTERS
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机译：电喷雾电离质谱仪的微细加工过程
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摘要
Microfabricated emitters for electrospray ionization mass spectrometry (ESI-MS) are produced using a soft lithography process. A substrate (6) is coated with a photo resist material (8). A photo mask (20) is positioned over the photo resist material (8) to selectively permit or prevent exposure of the photo resist material (8) to radiation, such as UV radiation. The resulting wafer is developed so that the portion of the photo resist that was not exposed to radiation is removed and the wafer forms a mold. Using a barrier or dam (10) on the photo resist patterned wafer, a suitable material such as polydimethylsiloxane (PDMS) is then prepared as a two-part material which is then poured over the wafer thus forming one layer of the emitter (18). The adjoining layer may be similarly formed with the top layer and bottom layer joined, such as by the application of oxygen plasma. The substrate may be coated with a second layer of photo resist material after radiation exposure of the first layer, but prior to development of the first layer, so as to provide more complex shapes.
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