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Method for controlling dopant profiles and dopant activation by electron beam processing
Method for controlling dopant profiles and dopant activation by electron beam processing
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机译:通过电子束处理控制掺杂剂分布和掺杂剂活化的方法
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摘要
An improved dopant application system and method for the manufacture of microelectronic devices accurately places dopant on and within a dielectric or semiconductor surface. Diffusing and activating p-type and n-type dopants in dielectric or semiconductor substrates is achieved by means of electron beam irradiation.
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