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System and method for performing thin film deposition or chemical treatment using an energetic flux of neutral reactive molecular fragments, atoms or radicals
System and method for performing thin film deposition or chemical treatment using an energetic flux of neutral reactive molecular fragments, atoms or radicals
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机译：使用中性反应性分子片段，原子或自由基的高能通量进行薄膜沉积或化学处理的系统和方法
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摘要
A system and method for forming a chemically reacted layer proximate an exposed surface of a substrate. A gas supply provides a chemically reactive molecular gas to an ion source that generates a divergent ion current directed at a target. The ion current contains at least one species of chemically reactive molecular ion, and the target is disposed in a chamber having a partial vacuum. A voltage source applies a bias to the target such that chemically reactive molecular ions from the ion source are accelerated toward the target with sufficient kinetic energy to dissociate at least some of the chemically reactive molecular ions by collision with the surface of the target to form a population of neutral chemically reactive molecular fragments, atoms or radicals at least some of which scatter away from the surface of the target and into the chamber. At least a portion of the population of neutral chemically reactive molecular fragments, atoms or radicals is intercepted at an exposed surface of a substrate disposed in the chamber. The chemically reacted layer corresponds to a product of at least one chemical reaction of the neutral chemically reactive molecular fragments, atoms or radicals intercepted by the substrate with other atoms proximate the exposed surface of the substrate.
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