首页>
外国专利>
Photomask supply system with photomask production period shortened
Photomask supply system with photomask production period shortened
展开▼
机译：缩短了光掩模生产周期的光掩模供应系统
展开▼
页面导航
摘要
著录项
相似文献
摘要
Specification data including a method of measuring the dimension and mask design data for a photomask pattern is transmitted from an order-sender computer via a communication line. An element dimension calculating unit generates a measurement recipe according to the dimension-measurement method and the mask design data to transmit the measurement recipe to an element dimension measuring unit. The element dimension calculating unit calculates production error data of the pattern according to measurement data and the mask design data to transmit the error data to the order-sender via the communication line.
展开▼
