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Alignment manner null of the sample which uses sample support feature and the said feature in the electron beam exposure
Alignment manner null of the sample which uses sample support feature and the said feature in the electron beam exposure
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机译：在电子束曝光中使用样品支撑特征和所述特征的样品的对准方式为零
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摘要
PROBLEM TO BE SOLVED: To enable a specimen to be supported adding no excessive load to the same while making alignment of the specimen within an electronic beam aligner. SOLUTION: A specimen 12 is inserted into a specimen container 11 provided on a frame 10. In the frame 10, abutted parts 13a-13c are provided on the three positions of the specimen container 11 for making alignment of the specimen 12 in the horizontal direction. Furthermore, three each of clamp mechanisms 14a-14c are provided on the frame 10 wherein the specimen 12 inserted into the specimen container 11 is held from front and back, thereby specimen 12 to be fixed and held as well as the alignment thereof in the vertical direction to be made.
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