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Dust cathode for coating substrates in cathode-ray dust collectors
Dust cathode for coating substrates in cathode-ray dust collectors
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机译：用于在阴极射线集尘器中涂覆基材的粉尘阴极
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摘要
Cathode base (1) has a hollow target (8) disposed thereon with at least one planar sputtering surface (8a), of circular shape for example, which is encompassed by at least two concentric, continuous projections (8b, 8c), and with a magnet system (6) with pole faces (6c, 6d) of opposite polarity lying on both sides of the target (8) for the production of magnetic lines of force (11, 11', . . . ) running substantially parallel to the sputtering surface (16a), the wall surfaces (8d, 8e) of the projections (8b, 8c) of the target (8), adjoining the sputtering surface (8a) being disposed at an angle ( alpha ) to the perpendicular, is preferably in a range between 30 and 70 degrees.
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