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Gas injector with a ceramic material block with gas injection holes, which extend through it, and a plasma containing the gas injector

机译:带有陶瓷材料块的注气器,该注料器具有穿过其延伸的注气孔和包含注气器的等离子体

摘要

A gas injector is constructed in such a manner in order to allow for the conditions within a half conductor preparation device to be able to better withstand, such as, for example, a plasma etching apparatus. The gas injector includes a body in the form of a ceramic material block and a gas injection section, the by first and second gas injection holes is formed, which extends through the ceramic material block extend. The ceramic material block has a first cylindrical section and a second cylindrical section, extending from the first cylindrical section extends from. The first cylindrical section is wider or further and longer than the second cylindrical section. The first holes of the gas injection section extend through the first cylindrical section of the ceramic material block, while the second holes through the second cylindrical section and, closely in the case of each of the or of a respective one of the first holes, and which are concentric with respect to these. The first holes are also further and longer than the second holes. The gas injector is connected to an upper portion of a plasma etching apparatus.
机译:气体喷射器以这样的方式构造,以便允许半导体制备装置内的条件能够更好地承受,例如等离子体蚀刻设备。气体喷射器包括陶瓷材料块形式的主体和气体喷射部分,由第一和第二气体喷射孔形成,其延伸穿过陶瓷材料块延伸。陶瓷材料块具有第一圆柱形部分和第二圆柱形部分,第二圆柱形部分从第一圆柱形部分延伸出。第一圆柱形部分比第二圆柱形部分更宽或更远和更长。气体注入部分的第一孔延伸穿过陶瓷材料块的第一圆柱部分,而第二孔穿过第二圆柱部分,并且在每个第一孔或每个第一孔的情况下紧密地延伸,并且相对于这些同心。第一孔也比第二孔更长且更长。气体喷射器连接到等离子体蚀刻装置的上部。

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